Here some customer feedback for the HF vapor phase etcher:
EPFL is vey satisfied with the Idonus HF Vapor etcher. The tool is very efficient and very complementary to other techniques like liquid HF etching followed by supercritical CO2 drying. The HF vapor is able to release tiny structures on sacrificial SiO2 layers with more success than any other known technique.
The tool is safe and its price is very affordable.
Dr. Philippe Flückiger, Director CMI - Center of MicroNanoTechnology , EPFL Lausanne. Switzerland
I would like to congratulate you on the conception of this apparatus for its simplicity and safety. It is perfect for our applications as well as for the essential task of teaching the techniques of microfabrication.
Philippe Vasseur, Laboratoire de Microfabrication de l'Ecole Polytechnique de Montreal